کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1620949 | 1005741 | 2010 | 6 صفحه PDF | دانلود رایگان |

α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93–1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.
Journal: Journal of Alloys and Compounds - Volume 489, Issue 2, 21 January 2010, Pages 469–474