کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1626680 | 1516441 | 2007 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Grain size estimations of annealed Ti–Ni shape memory thin films Grain size estimations of annealed Ti–Ni shape memory thin films](/preview/png/1626680.png)
Ti52.62Ni47.38 and Ti48.89N51.11 thin films were prepared by magnetron sputtering and post-annealed at 450, 500, 550 and 600 °C, respectively. Crystallization behavior and structure of Ti–Ni thin films were analyzed by differential scanning calorimetry (DSC) and X-ray diffraction (XRD), respectively. Line integral breadth method by XRD profiles was adopted to analyze the grain size and microstrains of annealed Ti52.62Ni47.38 and Ti48.89N51.11 thin films. The results showed that amorphous Ti52.62Ni47.38 and Ti48.89N51.11 thin films were crystallized at 460.5 and 490.8 °C with corresponding reaction enthalpy 14.8 and 20.6 J/g, respectively. As annealing temperature increased, crystallization degree and content of B2 and precipitate phases increased. Meanwhile grain size increased and microstrains decreased with increasing annealing temperature. Transmission electron microscopy (TEM) observation was made to confirm the feasibility of XRD analysis.
Journal: Journal of Alloys and Compounds - Volume 432, Issues 1–2, 25 April 2007, Pages 318–322