Surface microstructurization of a sputtered magnesium thin film via a solution–immersion route

Surface microstructurization is one of the important procedures to fabricate a superhydrophobic surface of materials. Thus, this study was focused on the modification of the surface microstructure of magnesium materials to tailor its wettability. Bias magnetron sputtering was used to prepare magnesium thin films. In the deposition process, a relatively dense magnesium film was obtained using the bias voltage of 200 V. A solution–immersion method was subsequently applied to modify the surface of the magnesium thin film. A honeycomb-like layer, mainly composed of Mg(OH)2, was formed on the film's surface after the surface modification. Accordingly, this route provides a basis for the following surface functionization of magnesium materials.