کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1652281 1007640 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Wetting kinetics of a hypo-eutectic Al–Si system
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Wetting kinetics of a hypo-eutectic Al–Si system
چکیده انگلیسی

This study is devoted to investigation of spreading of a hypo-eutectic Al 8Si system over a flat Al surface. Wetting kinetics was studied using a real time in situ monitoring of the triple line movement facilitated by a hot-stage microscopy system under controlled atmosphere. Analysis of the validity of the classic Tanner's law correlation developed for inert wetting systems is performed. A good agreement of the power relationship between the triple line location and time was established. The dispersion of the n-power exponent magnitude is between 9 and 13, with an average value of 11.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 62, Issue 15, 31 May 2008, Pages 2241–2244
نویسندگان
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