Boron thin film deposition by using Thermionic Vacuum Arc (TVA) technology

In this paper a new technology for boron thin film deposition is presented. The film in high vacuum conditions is condensing on the sample from the plasma state of the vapor phase of the anode material, generated by a Thermionic Vacuum Arc (TVA). Boron coating is one of the technologies recently considered to be of special interest due to the qualities of boron. The aim of this paper is to present the use of TVA technology for boron coating.