Chemical mechanical polishing and electrochemical characteristics of tungsten using mixed oxidizers with hydrogen peroxide and ferric nitrate

In this paper, the interaction between the tungsten surface and the oxidizer was discussed by potentiodynamic polarization test in order to compare the chemical mechanical polishing (CMP) performances and electrochemical behavior of the tungsten film as a function of mixed oxidizers. The potentiodynamic polarization results indicated that the corrosion current densities of 5 wt.% Fe(NO3)3 + 5 wt.% H2O2 were higher than the other mixed oxidizers. Such an electrochemical corrosion effect implies that slurries with the highest removal rate (RR) have high dissolution rate.