کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1654713 | 1517350 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N2 ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 5∼10 nm in diameter. The microstructure became fine as the flow rate of N2 to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 59, Issues 29–30, December 2005, Pages 3929–3932
Journal: Materials Letters - Volume 59, Issues 29–30, December 2005, Pages 3929–3932
نویسندگان
Taek-Soo Kim, Sang-Shik Park, Byong-Taek Lee,