کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1657133 1517614 2015 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Water content and high temperature influence on the oxidation behavior of manganese and silicon thin films on iron matrix
ترجمه فارسی عنوان
محتوای آب و درجه حرارت بالا بر روی رفتار اکسیداسیون فیلم های نازک منگنز و سیلیکون در ماتریکس آهن تاثیر می گذارد
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Mn and Si thin film thickness gradients were evaporated on Fe substrates.
• The Mn and Si films were studied at annealing temperatures between 750 and 950 °C.
• Mn and Si high temperature oxidation potential was defined varying the H2O content.
• During oxidation of both Mn and Si, crystal growth depends on annealing conditions.
• High temperature Fe diffusion through the Si thin film was revealed.

Mn and Si thin films were deposited by thermal evaporation on different Fe-substrates. The use of a mobile shutter during deposition allowed a thickness gradient to be obtained along each sample favoring thickness dependent annealing investigations of Mn and Si films on Fe. The annealing behavior of the prepared thin films was investigated at temperatures ranging between 750 and 950 °C under different atmospheric conditions. Not only the temperature, but also the O2 partial pressure used as well as the film thickness influenced the oxidation behavior of the thin film samples during annealing. The Mn thin film deposited on the Fe substrate and annealed at varying conditions revealed a strong crystal growth. This depended on all annealing variables resulting in a grain size decrease with decreasing temperature, O2 partial pressure and film thickness. The Si coated substrate showed a different oxidation behavior as compared to the Mn case, revealing mainly a thickness independent homogeneously oxidized surface. However, the heat treatment conditions were still evaluated as influencing factor for the Si thin film gradient because under specific conditions Fe diffusion through the Si thin film could be observed.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 265, 15 March 2015, Pages 145–153
نویسندگان
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