کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1657179 1517612 2015 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth condition of amorphous ZTO films from rotatable targets
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Growth condition of amorphous ZTO films from rotatable targets
چکیده انگلیسی


• Industrial scalable ZTO and GZTO rotatable targets were produced.
• Position resolved the evaluation of electrical and optical properties.
• Simulation of negative charged oxygen ions to evaluate the process damage of the film.
• Prevention of film damage due to optimized growth conditions

In the last years, amorphous oxide films like indium gallium zinc oxide (IGZO) received increasing attention as channel layers in thin film transistors (TFTs). First IGZO-based devices are being successfully introduced into the display market. However, there is also a strong interest to replace or substitute the resource-limited indium. Additionally, alternative oxide materials are being explored. A promising candidate is zinc-tin-oxide (ZTO) with similar properties and performance as IGZO. Typically, indium containing materials are more stable against plasma damage during the sputtering process. Therefore we studied the growth mechanism of ZTO films sputtered from novel rotatable oxide targets both experimentally and through particle-in-cell Monte-Carlo (PIC-MC) plasma simulation. Static imprints are deposited and characterized in terms of electrical and optical performance distribution in order to understand the mechanisms of plasma damage. By PIC-MC plasma simulations, possible origins of plasma damage such as negative oxygen ions are revealed and compared with the experimental data. The comparison of experimental and simulated data allows for designing improved coater geometries with respect to reduced plasma damage and increased film uniformity.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 267, 15 April 2015, Pages 75–80
نویسندگان
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