Porous structure preparation and wettability control on titanium implant

Titanium (Ti) osseointegration is critical for the success of dental implants. Previous studies have shown that wettability controls are of great importance for their biomedical application. Only relatively recently have the effects of a plasma oxidized surface on cell response been considered. The aim of the present study was to develop a simple and scalable surface modification treatment that introduces a plasma oxidation method to the surfaces of Ti substrates without changing the original morphologies of other surface features. The controlled micro/nano-structure surfaces of Ti substrates are achieved by using the sandblast-acid etching (SLA) process. Then, titanium oxide surfaces are achieved on SLA surfaces by using a plasma oxidation base on radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system, while retaining the starting SLA micro/nano-texture topography. The water contact angles (CA) of these surfaces increase and then decrease with the self-bias voltage. A superhydrophilic TiO2 (anatase) surface can be achieved when the self-bias voltage is 360 V. Such plasma oxidized surfaces showed a crystal structure of an anatase (101) orientation and possessed elemental compositions of TiO2, Ti2O3 and TiO. MG63 cells were seeded on plasma oxidized Ti disks. The results suggested that the introduction of such plasma oxidized surfaces in combination with micro/nano-structures improves osteoblast attaching and spreading, which, in turn, indicates the potential for improved implant osseointegration in vivo.

► Our plasma oxidization method can be expected to provide strong adherent film.
► We form a TiOx layer on the SLA treated titanium without altering the topography.
► Superhydrophilic and hydrophobic surface can be tuned well by suitable process.