The characteristics of CdxSn1 − xO films prepared by RF magnetron sputtering from powder targets

Transparent conductive cadmium and tin oxide films (CdxSn1 − xO TCO) prepared by RF magnetron sputtering from the mixed oxide powder targets were with similar compositions to those of the targets. The morphological structures of the films were columnar in the grain sizes over 100 nm. New phrases were formed for the films with proper metallic ratio, i.e. x = 0.5 and 0.7 and the mixture of nano-crystal and amorphous structure might exist. Also, the nano-crystal structure with severe lattice deformation could be seen in the x = 0.2 and 0.8 films, and all nano-crystals were in domain sizes about 10–20 nm. Other multi-component films were with amorphous structure. The average transmittance of the films within the visible wavelength, except for the pure CdO film, was over 80%. The concentrations of electrons of these n-type CdxSn1 − xO films were in the order of 1020 cm− 3. Without considering of the pure CdO and SnO2 films, the high mobilities (up to 50 cm2/V s) can be obtained from the films with amorphous structure. The resistivities of the films decreased from 10− 3 to 10− 4 Ω·cm with the increases of Cd ratios in the films.

► The structure of CdxSn1 − xO films depended on the ratio of Cd:Sn.
► The high mobility of the electrons benefited from the amorphous structure.
► The transmittance of the films increased by adding Sn into CdO.