کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1658047 1517651 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers
چکیده انگلیسی

Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the artful technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the van der Pauw technique.


► Dc reactive sputtering was implemented with the reactive gas pulsing process.
► Structural analyses combination allowed determining the different phases in each multilayer.
► HRTEM pointed out the dependence between electrical properties and nanometric and periodic αTa/a-Ta2O5 multilayers.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 227, 25 July 2013, Pages 38–41
نویسندگان
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