Preparation and properties of atomic oxygen protective films deposited on Kapton by solvothermal and sol–gel methods

Due to a smooth hydrophobic surface of Kapton, it is very difficult for other materials to bond to it. In this study, using solvothermal method to modify the surface of Kapton substrates, the adhesion between silica film and Kapton substrate was greatly improved. Silica films were prepared on Kapton substrate via sol–gel method and the samples were irradiated by atomic oxygen (AO) in a ground-based simulation system. The AO erosion yield values of the samples after AO irradiation were tested. The surface morphology and the structure of silica films were investigated by scanning electronic microscope (SEM) and Fourier transformed infrared spectroscopy (FTIR). The results indicated that a uniform thin film was easily formed on the surface of Kapton. After AO exposure, the silica films become smoother and more uniform, without peeling off, and the AO erosion yield of coated Kapton was sharply down, equivalent to only 4.7% of pristine Kapton.

► Solvothermal process is an effective method to improve the surface wettability of Kapton.
► After AO exposure, the silica films become more uniform and compact, without crack and falling.
► The AO erosion yield of silica coated Kapton is sharply down, equivalent to only 4.7% of pristine Kapton.