کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1658881 | 1008362 | 2011 | 4 صفحه PDF | دانلود رایگان |

Wetting properties of ceramic materials may be enhanced by treating them with high-intensity plasma pulses carrying a substantial fraction of metallic ions. Rod Plasma Injectors (RPI), developed originally for fusion studies, may generate such plasma pulses containing the working gas used for discharge initiation and the metal ions eroded from the discharge electrodes. We examined the plasma pulse technology and concluded that it is possible to extend the range of system parameters appropriate for wetting enhancement. We also studied the physical properties of plasma treated carbon and silicon carbide samples in an attempt to disclose the origin of wettability differences between them. We finally conclude that these differences are due to the morphology of the treated surfaces.
Research Highlights
► RPI devices may generate plasma pulses containing the working gas and the metal ions.
► Wettability of ceramics may be enhanced by treating them with HIPPB.
► The current break delay τB is the main parameter of the treatment processes.
► The amount of deposited material depends on τB.
► Chemical state of the HIPPB-treated surface has no effect on the wettability.
Journal: Surface and Coatings Technology - Volume 206, Issue 5, 25 November 2011, Pages 916–919