کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1659890 | 1008392 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Sputter deposition and XPS analysis of nickel silicide thin films
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Sputter deposition and XPS analysis of nickel silicide thin films Sputter deposition and XPS analysis of nickel silicide thin films](/preview/png/1659890.png)
چکیده انگلیسی
Binary component Ni–Si films of different compositions are fabricated on AISI 304L stainless steels by means of ion-beam sputter (IBS) deposition. The compositions of the thin films and the chemical states of elements are analysed by means of X-ray photoelectron spectroscopy (XPS). The phase formation is studied and discussed in view of Pretorius' effective heat of formation (EHF) model. The proportions of the resulting phases can then be deduced. The electronic structure for the various compositions is also qualitatively investigated from the XPS valence band spectra, suggesting the bonding changes from predominating metallic to covalent bonding in Ni–Si systems when Si content increases.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 203, Issue 19, 25 June 2009, Pages 2886–2890
Journal: Surface and Coatings Technology - Volume 203, Issue 19, 25 June 2009, Pages 2886–2890
نویسندگان
P.L. Tam, L. Nyborg,