Atmospheric pressure barrier torch discharge and its optimization for flexible deposition of TiO2 thin coatings on various surfaces

This paper reports on the preparation of titanium (IV) oxide films via the improved atmospheric pressure barrier torch discharge (BTD) deposition. This approach is a modification of the atmospheric pressure glow discharges (APGDs) ranking among plasma enhanced chemical vapor deposition (PECVD) techniques. These methods are based on plasma–chemical reactions of the precursors' vapors occurring in the active plasma environment. The layers are produced in terms of heterogeneous recombination reactions of the high active species on the supporting surface. The major treated topic comprises the influence of the used support on the physical properties of the layers. A set of three different supports was used including quartz slides (non-conducting, dielectric), silicon discs (semi-conducting) and polished Ni sheets (conducting). Crystallographic structure, surface roughness, surface wettability and the film thickness were assessed and used as a set of physical properties to be discussed and compared for each of the films and mutually. In parallel the qualitative analysis of the emission spectra of the barrier torch discharge during the deposition process was also presented. Different conductive connection of plasma stream with the substrate crucially influences the temperature of this substrate. It has a direct effect mainly on the crystallinity and morphology of the films and also on the plasma parameters. This knowledge might be used as a tool for the optimization of deposition conditions. Photocatalytic functionality of the layers was quantified in a simple test based on the photocatalytic oxidation of Rhodamine B (C28H31ClN2O3) under UV radiation.