کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1660550 | 1008405 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough structure on a substrate. A maximum contact angle of approximately 162° was obtained and the film grew in the shape of a double roughness structure, similar to a lotus leaf, indicating a super-hydrophobic surface. The results of the aging test indicated that the as-grown super-hydrophobic surface was stable against moisture and was only dependent on the growing structure of films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 204, Issue 4, 15 November 2009, Pages 428–432
Journal: Surface and Coatings Technology - Volume 204, Issue 4, 15 November 2009, Pages 428–432
نویسندگان
M.C. Kim, C.-P. Klages,