کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1660828 1008413 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering
چکیده انگلیسی

Thin ZrO2 films were prepared using dual frequency oxygen reactive plasma sputtering for wear-resistance coating of ceramics products. Influences of ion-bombardment-energy Ei were investigated for improvement of film characteristics. The results revealed that the deposition rate and the hardness of the prepared ZrO2 thin films gradually increased with increasing Ei for Ei < 220–250 eV and then decreased, whereas the water-contact-angle on ZrO2 thin films was about 90 °, having a good water-repellent nature.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issue 15, 23 April 2007, Pages 6627–6630
نویسندگان
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