Thermal conductivity of titanium dioxide films grown by metal-organic chemical vapor deposition

We studied the effect of the microstructures on the thermal conductivity of the titanium dioxide (TiO2) films. TiO2 films were grown by MOCVD, their morphologies were observed using a scanning electron microscope (SEM). The chemical composition was determined through Rutherford backscattering spectroscopy (RBS) and nuclear reaction analysis (NRA) measurements. The thermal conductivity of the in-plane direction was measured using an alternating current calorimetric method (laser-heating Angstrom method) in the temperature range of 300 to 470 K. The authors fabricated a TiO2 film with extremely low thermal conductivity (~ 0.5 Wm− 1 K− 1), in which a feather-like texture is regularly arranged in the direction perpendicular to the heat flow. The origins of the extremely low thermal conductivity were studied from a microstructural viewpoint.