کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1661661 | 1517695 | 2007 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of substrate orientation on film properties using AC reactive magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
CrN coatings were prepared by magnetron sputtering with target-substrate orientations varying between 0° and 90° and N2 flow rates of 43, 40 and 30 sccm. The coatings were deposited on (111) Si wafers at a chamber pressure of 0.2 Pa for 1 h. Initial results indicate that the target-substrate orientation to the incoming flux of ionized species affects the microstructure, phase and preferred orientation of the crystallites in Cr-N coatings. The SEM studies of the film morphology showed a distinct change from coarser, less dense coatings to smooth, dense and fine-grained morphologies as a function of the changing orientation of the substrate, while the cross-sectional micrographs showed a columnar growth of the crystallites independent of substrate orientation. When the target-substrate angle was varied from 0° to 90°, the average roughness (Ra) decreased from 78 to 23 nm. We report on the details of the microstructural and chemical characterization of the films deposited in this study.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issues 4â7, 15 December 2007, Pages 755-761
Journal: Surface and Coatings Technology - Volume 202, Issues 4â7, 15 December 2007, Pages 755-761
نویسندگان
S.R. Pulugurtha, D.G. Bhat, M.H. Gordon, J. Shultz,