کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1661661 1517695 2007 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of substrate orientation on film properties using AC reactive magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Effect of substrate orientation on film properties using AC reactive magnetron sputtering
چکیده انگلیسی
CrN coatings were prepared by magnetron sputtering with target-substrate orientations varying between 0° and 90° and N2 flow rates of 43, 40 and 30 sccm. The coatings were deposited on (111) Si wafers at a chamber pressure of 0.2 Pa for 1 h. Initial results indicate that the target-substrate orientation to the incoming flux of ionized species affects the microstructure, phase and preferred orientation of the crystallites in Cr-N coatings. The SEM studies of the film morphology showed a distinct change from coarser, less dense coatings to smooth, dense and fine-grained morphologies as a function of the changing orientation of the substrate, while the cross-sectional micrographs showed a columnar growth of the crystallites independent of substrate orientation. When the target-substrate angle was varied from 0° to 90°, the average roughness (Ra) decreased from 78 to 23 nm. We report on the details of the microstructural and chemical characterization of the films deposited in this study.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 202, Issues 4–7, 15 December 2007, Pages 755-761
نویسندگان
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