کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1661971 | 1517703 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
HfB2 and Hf–B–N hard coatings by chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Hard, dense and conformal hafnium diboride (HfB2) thin films were obtained by CVD from the precursor Hf[BH4]4 at deposition temperatures ≤ 350 °C. As-deposited films were X-ray amorphous but transformed to a nanocrystalline structure after being annealed at 700 °C. Amorphous HfB2 films exhibited a respectable hardness of 20 GPa; the hardness increased in the nanocrystalline state to 40 GPa. Ternary Hf–B–N films, which consisted of a mixture of HfB2, HfN and BN were obtained by adding atomic nitrogen to the growth flux. The formation of the softer a-BN phase produced a drop in the hardness and modulus values. A multilayer HfB2/Hf–B–N exhibited a good combination of high hardness (33 GPa) and low elastic modulus (300 GPa).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 22–23, 20 June 2006, Pages 6629–6633
Journal: Surface and Coatings Technology - Volume 200, Issues 22–23, 20 June 2006, Pages 6629–6633
نویسندگان
S. Jayaraman, J.E. Gerbi, Y. Yang, D.Y. Kim, A. Chatterjee, P. Bellon, G.S. Girolami, J.P. Chevalier, J.R. Abelson,