کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662213 | 1517704 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Microstructural evolution of allylamine polymerized plasma films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The present paper deals with the characterization of plasma polymerized allylamine films. The films were characterized using a large panel of techniques such as Fourier transformation infrared spectroscopy, X-ray photoemission spectroscopy and ellipsometry. The film microstructure was investigated as a function of the deposition power while other process parameters (gas mixture flow, pressure) were kept constant. The microstructure shows a strong dependence on the deposition power. A power transition has been identified outlining two deposition modes in agreement with a growth model developed for carbon nitride thin films. Conditions of deposition closed to this transition provide a film microstructure interesting for absorption and adhesion of biomolecules i.e. high NH2 content, high porosity and high deposition rate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 20â21, 22 May 2006, Pages 5902-5907
Journal: Surface and Coatings Technology - Volume 200, Issues 20â21, 22 May 2006, Pages 5902-5907
نویسندگان
Michaël Lejeune, Frédéric Brétagnol, Giacomo Ceccone, Pascal Colpo, François Rossi,