Dimethylgold(III) carboxylates as new precursors for gold CVD

Dimethylgold(III) carboxylates of general formula [(CH3)2Au(OOCR)]2 (R = methyl, or tert-butyl) were synthesized with high yields. The products are stable to air and moisture and soluble in most common organic solvents. An elemental analysis, X-ray, mass-spectrometry, IR, and 1H NMR spectroscopy were used for characterization of prepared compounds. The thermal properties of gold compounds in solid state were investigated by the TG method. The temperature dependences of saturated vapor pressure were studied by the Knudsen effusion method. The thermodynamic parameters of the sublimation process ▵H°Т and ▵S°Т were calculated. Thermal decomposition of the vapor of gold complexes was studied by means of high temperature mass spectrometry in vacuum, and by-products of decomposition were determined. The CVD processes of gold film deposition were carried out at atmospheric pressure. Silicon was used as a substrate. The evaporation temperature was varied from 95 to 120 °C. The substrate temperature was 210 °C. The gold film samples were investigated by means of SEM and X-ray diffraction analysis.