Influence of kinetic energy and substrate temperature on thin film growth in pulsed laser deposition

By performing studies using the kinetic Monte Carlo method, we have simulated the energetic growth process in pulsed laser deposition. In our model, we focus on the influence of particles' kinetic energies on island aggregation and obtain the different results in the cases of the average kinetic energy Ek=0, 5 and 10 eV. The results indicate that in the early stage of film growth, the nucleation density still obeys the general scaling function that is different from the ordinary power law form. Moreover, we analyze the simulation results and find a similar effect of incident particles' kinetic energies and substrate temperature on film deposition, which is in agreement with other reported experimental and theoretical results.