کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1662961 | 1517697 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Biomedical response of tantalum oxide films deposited by DC reactive unbalanced magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Tantalum oxide (Ta-O) films have been widely used as dielectric, optoelectronics and high temperature resistance materials. But the biological response of the Ta-O films is rarely studied. In this paper, the biomedical properties of Ta-O films were studied. Tantalum oxide films were deposited on Si(100) and glass substrate at different oxygen-to-argon ratios by DC reactive unbalanced magnetron sputtering. The structure, blood compatibility, surface energy and semiconductor properties were studied. The results showed that the Ta-O films were amorphous and its optical band-gap increased from 3.65Â eV to 3.95Â eV with increasing oxygen pressure. The surface energy of Ta-O films were about 40-46Â mJ/m2. The low surface energy, and low dispersive energy were the reasons of their better blood compatibility. There were less platelet adhered and aggregated at the Ta-O film which deposited at O2/Ar ratio 0.4, and it had better antithrombotic properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 201, Issues 19â20, 5 August 2007, Pages 8062-8065
Journal: Surface and Coatings Technology - Volume 201, Issues 19â20, 5 August 2007, Pages 8062-8065
نویسندگان
W.M. Yang, Y.W. Liu, Q. Zhang, Y.X. Leng, H.F. Zhou, P. Yang, J.Y. Chen, N. Huang,