کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1663495 1517707 2006 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Zr–Si–N films fabricated using hybrid cathodic arc and chemical vapour deposition: Structure vs. properties
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Zr–Si–N films fabricated using hybrid cathodic arc and chemical vapour deposition: Structure vs. properties
چکیده انگلیسی

ZrSiN coatings with a nanocomposite structure consisting of ZrN crystallites connected by a thin layer of amorphous Si3N4 at the grain boundaries have been deposited on Si wafer substrates using a new hybrid PVD–CVD process. The microstructure and mechanical properties of coatings of varying Si content were compared. It was found that the addition of Si from a liquid precursor of tetramethylsilane (TMS) to ZrN results in an increase in hardness up to a Si concentration of ∼3 at.% but the hardness drops with further additions of Si. The grain size initially decreases dramatically to ∼10 nm with the addition of Si at 3 at.%, becoming more equiaxed. It then continues to decrease slowly as the Si content is increased. XPS spectra revealed the presence of phases other than ZrN and Si3N4, including ZrO, ZrC and elemental Si, however these phases are not observed in selected area diffraction patterns obtained in the transmission electron microscope.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 14–15, 10 April 2006, Pages 4213–4219
نویسندگان
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