کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1677652 1518353 2013 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Quantitative three-dimensional carrier mapping in nanowire-based transistors using scanning spreading resistance microscopy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Quantitative three-dimensional carrier mapping in nanowire-based transistors using scanning spreading resistance microscopy
چکیده انگلیسی

The performance of nanoelectronic devices critically depends on the distribution of charge carriers inside such structures. High-vacuum scanning spreading resistance microscopy (HV-SSRM) has established as the method of choice for quantitative 2D-carrier mapping in nanoscale devices during the last decade. However, due to the 3D-nature of these nanoscale device architectures, dopant incorporation and dopant diffusion mechanisms can vary for any of the three dimensions, depending on the particular processes used. Therefore, mapping of carriers in three dimensions with high spatial resolution is inevitable to study and understand the distribution of active dopants in confined 3D-volumes and ultimately to support the process development of next generation devices. In this work, we present for the first time an approach to extend the capabilities of SSRM from an inherent 2D-carrier profiling technique towards a quantitative 3D-characterization technique based on the example of a nanowire (NW)-based heterojunction (SiGe–Si) tunneling transistor. In order to implement a 3D-methodology with a 2D-imaging technique, we acquired 2D-carrier concentration maps on successive cross-section planes through the device of interest. This was facilitated by arranging several devices in a staggered array, allowing to produce a series of cross-sections with incremental offset by a single cleave. A dedicated interpolation algorithm especially suited for structures with rotational symmetry like NWs was developed in order to reconstruct a 3D-carrier distribution map. The validity of the method was assessed by proving the absence of variations in carrier distribution in the third dimension, as expected for NWs etched into a blanket stack.


► A methodology for 3D carrier mapping in nanowire-based transistors is presented.
► We developed a slice-and-view approach whereby 2D maps are combined to a 3D map.
► A staggered design was used to generate cross-sections at different depth values.
► Dedicated interpolation algorithm for the reconstruction of a 3D map was developed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 125, February 2013, Pages 18–23
نویسندگان
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