کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1678390 1009941 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of Pentacene wetting layer on the SiO2 surface and charge trap in the wetting layer
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Formation of Pentacene wetting layer on the SiO2 surface and charge trap in the wetting layer
چکیده انگلیسی

We studied the early-stage growth of vacuum-evaporated pentacene film on a native SiO2 surface using atomic force microscopy and in-situ spectroscopic ellipsometry. Pentacene deposition prompted an immediate change in the ellipsometry spectra, but atomic force microscopy images of the early stage films did not show a pentacene-related morphology other than the decrease in the surface roughness. This suggested that a thin pentacene wetting layer was formed by pentacene molecules lying on the surface before the crystalline islands nucleated. Growth simulation based on the in situ spectroscopic ellipsometry spectra supported this conclusion. Scanning capacitance microscopy measurement indicated the existence of trapped charges in the SiO2 and pentacene wetting layer.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 108, Issue 10, September 2008, Pages 1050–1053
نویسندگان
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