Characterization of hydrogenated and deuterated thin carbon films deposited by magnetron sputtering

Thin films of C layers were deposited by radiofrequency magnetron sputtering on silicon substrates using three gaseous atmospheres: pure Ar, Ar + H2 and Ar + D2 mixtures. Scanning Electron Microscopy investigations showed that addition of D2 or H2 to main sputtering gas (Ar) leads to the enhancement of the deposition rate while the layer morphology remained columnar. Fourier Transform Infrared Spectroscopy measurements revealed the presence of D–C or H–C chemical bonds in the samples. Ion beam analysis measurements performed by simultaneous recording of the recoiled H and D ions, and of backscattered 4He confirmed the incorporation of hydrogen and deuterium in the deposited carbon thin films.