کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1684179 | 1010524 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evolution of ion-induced ripple patterns on SiO2 surfaces
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Evolution of ion-induced ripple patterns on SiO2 surfaces Evolution of ion-induced ripple patterns on SiO2 surfaces](/preview/png/1684179.png)
چکیده انگلیسی
The evolution of nanoscale ripple patterns during sub-keV ion sputtering of thermally grown, fused and single crystalline SiO2 surfaces has been investigated by means of atomic force microscopy. For all three materials, different dependencies of the ripple wavelength and the surface roughness on the ion fluence have been found. Within the Bradley–Harper model of pattern formation, the observed differences are consistent with different amounts of surface and near-surface mass transport by ion-enhanced viscous flow which might result from different surface energies of the SiO2 specimens.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 4, February 2009, Pages 656–659
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 4, February 2009, Pages 656–659
نویسندگان
Adrian Keller, Stefan Facsko, Wolfhard Möller,