کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1687366 1010652 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Epitaxy and cathodoluminescence in α-quartz after Ge, Ba and Rb ion implantation
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Epitaxy and cathodoluminescence in α-quartz after Ge, Ba and Rb ion implantation
چکیده انگلیسی

Ion implantation used for doping quartz with photoactive impurity atoms amorphizes the matrix already at moderate fluences. Following our recent studies on dynamic, laser-induced or chemical epitaxy of ion-irradiated α-quartz, this paper focuses on the cathodoluminescence (CL) spectra obtained after Ge, Ba, Rb and double Rb/Ge ion implantation, under the conditions of dynamic or chemical epitaxy. In addition to “intrinsic” subbands in the CL-spectra, several blue and violet bands correlated with the particular implanted ion species were observed. In the case of Ba, nearly complete dynamic epitaxial growth was achieved, but not for Ge. In the case of Rb, full chemical epitaxy was obtained upon annealing in oxygen or air, but the CL output decreased above 1000 K due to Rb outdiffusion. Double Rb/Ge implantation and annealing in air appears as a very promising novel route to achieve high CL light output and full recrystallization.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 244, Issue 1, March 2006, Pages 272–277
نویسندگان
, , , ,