Effects of MPII-implanted titanium on the electrochromic properties of tungsten trioxide

There are great interests in electrochromic (EC) technology for smart windows and displays over the last decade. The substrate, a conductive glass being coated indium tin oxide (ITO) thin films, deposited tungsten trioxide (WO3) using radio-frequency (RF) sputtering and implanted Ti by a metal–plasma ion implantation (MPII) in this study. The optical density (when the implanted dose is less than 2 × 1015 ions/cm2) is approximately 1.6 times the unimplanted Ti. At low implanted dose +6 valence tungsten ions improve optical density. At high implanted dose, low-valence tungsten ions reduce the optical density.