کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1687926 | 1518761 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transformation of {1 1 3} defects into dislocation loops mediated by the {1 1 1} rod-like defects
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We present a study of the transformation of extended defects during annealing at 800 °C (from 15 to 2700 s) of preamorphised silicon (30 keV, 1 × 1015 Ge+/cm2). After the early stages, during which the {1 1 3}-rod-like (RL) defects represent the majority defect type, the {1 1 1}-RLs and the dislocation loops (DLs) grow in size and density. After 300 s, the majority of the excess interstitial atoms are bound by the {1 1 1}-RLs. Eventually, after 2700 s all the available Si atoms are stored in the DLs. These results suggest that the {1 1 1}-RL defects are more energetically stable than {1 1 3}s and less stable than DLs.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 253, Issues 1–2, December 2006, Pages 80–84
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 253, Issues 1–2, December 2006, Pages 80–84
نویسندگان
S. Boninelli, N. Cherkashin, A. Claverie, F. Cristiano,