کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1687964 1518761 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Combination of gettering and etching in multicrystalline silicon used in solar cells processing
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Combination of gettering and etching in multicrystalline silicon used in solar cells processing
چکیده انگلیسی
Undesired impurities can be removed away from multicrystalline silicon (mc-Si) wafers by combining porous silicon (PS) formation and heat treatments. The gettering procedure used in this work is based on the formation of a PS film at both back and front sides of the mc-Si wafers, followed by a heat treatment. The latter was achieved in an infrared furnace at different temperatures and during various periods. We show that when the based material undergoes such a gettering, the electrical properties (short-circuit current, open-circuit voltage, serial and shunt resistances) and the electronic parameters (diffusion length and grain boundary recombination velocity) of the corresponding solar cells can be improved only if some regions of the wafers are etched. Compared to reference cells based on untreated wafers, the diffusion length and grain boundary recombination velocity of solar cells fabricated from gettered and etched samples was improved by about 30% and reduced by a factor of 10, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 253, Issues 1–2, December 2006, Pages 264-268
نویسندگان
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