کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689232 | 1011223 | 2008 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effect of process conditions on the properties of bioactive films prepared by magnetron sputtering
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Radio frequency (RF) magnetron sputtering is a promising deposition technique that can produce dense and well-adhered films. This technique is applied to deposit thin HA films on titanium oral implants, which have exhibited excellent bioactive behavior. In this paper, the influence of key deposition parameters, including discharge power, gas composition, process pressure, base pressure, substrate temperature, bias, target-substrate distance on the properties of bioactive films are reviewed. Besides, other influencing factors such as post-deposition heat treatments and initial target materials are also introduced. At last, the future application of RF magnetron sputtering in biomedicine is presented.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 83, Issue 2, 26 September 2008, Pages 249–256
Journal: Vacuum - Volume 83, Issue 2, 26 September 2008, Pages 249–256
نویسندگان
J.Z. Shi, C.Z. Chen, H.J. Yu, S.J. Zhang,