کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691209 1011300 2008 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructural and optical properties of BN films deposited by inductively coupled plasma CVD
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Microstructural and optical properties of BN films deposited by inductively coupled plasma CVD
چکیده انگلیسی

Boron nitride films were deposited at different substrate temperatures (400–600 K) on Si (100) substrates by RF plasma CVD technique using a mixture of borane-ammonia, argon and nitrogen as the precursor gases. No intentional bias was applied during deposition to modulate the ion energy. The surface textures of the films were obtained by Atomic Force Microscope studies (AFM). X-ray Photoelectron Spectroscopy (XPS) studies were carried out to determine the bonding environment in the coatings. Fourier Transformed Infra-Red (FTIR) spectrums indicated that the films deposited at lower substrate temperature contained h-BN phases and the percentage of c-BN content in the films increased with the substrate temperature. Films deposited at temperature ∼553 K were predominantly c-BN in nature.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 11, 19 June 2008, Pages 1296–1301
نویسندگان
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