کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1790169 1524418 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dislocation generation at near-coincidence site lattice grain boundaries during silicon directional solidification
ترجمه فارسی عنوان
تولید نشتی در مرزهای دانهی شبکه نزدیک به همپوشانی در طی انجماد سیلیکون جهت
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
چکیده انگلیسی
Bi-crystal silicon ingots separated by near-coincident site lattice (near-CSL) grain boundaries (GBs), namely Σ9 and Σ27a, have been grown in a small scale Bridgman-type furnace at 3 µm/s. Surface observations show different microstructure developments, depending on the nature of the seed GB and initial deviation from the low energy configuration. Grain boundary structure evolution and dislocation emission sources have been assessed for both types of GBs. Topological imperfections forming at the near - Σ9 and Σ27 GBs during the growth have been found to be the major source of defect generation. These imperfections are the result of the re-arrangement of the GBs during the growth due to the seed GBs deviation from low energy configurations - i.e. Σ9{221}1/{221}2 and Σ27a{511}1/{511}2.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 411, 1 February 2015, Pages 12-18
نویسندگان
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