کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1794384 1023696 2009 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Improving the growth of electron-doped Pr2−xCexCuO4+δ thin films made by pulsed-laser deposition using excess CuO
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Improving the growth of electron-doped Pr2−xCexCuO4+δ thin films made by pulsed-laser deposition using excess CuO
چکیده انگلیسی
We report on a major improvement in the growth of electron-doped cuprate thin films by pulsed-laser deposition (PLD). Using Cu-rich targets, we affect the stability of secondary phases relative to Pr2−xCexCuO4+δ (PCCO). The resulting new generation of PLD PCCO epitaxial thin films shows no trace of the parasitic phases and resistivity lower than the old generation of thin films and comparable to the best films made by molecular-beam epitaxy. The absence of the intercalated phases even after reduction suggests that Cu migration is not required to induce superconductivity in our defect-free films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 311, Issue 5, 15 February 2009, Pages 1340-1345
نویسندگان
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