Highly strained quantum structures grown on GaAs (0 0 1) vicinal substrate by MOCVD

In this paper, we report experimental results regarding highly strained InP and InAs/InP quantum nanostructures grown on vicinal GaAs (0 0 1) substrate with 7° miscut towards (1 1 0) orientation by MOCVD using TBA and TBP as group V sources. Formation of well-aligned wire nanostructures has been observed, which may be attributed to the effects of multi-atomic steps formed during GaAs buffer layer growth. We also observed strong photoluminescence from these nanostructures even for the type II band gap alignment of the InP/GaAs quantum wires. Our results show a possible way for fabricating low-dimensional quantum nanostructures with band gap engineering.