کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1796623 | 1023750 | 2006 | 4 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Effect of post-annealing in oxygen atmosphere on the photoluminescence properties of nc-Si rich SiO2 films Effect of post-annealing in oxygen atmosphere on the photoluminescence properties of nc-Si rich SiO2 films](/preview/png/1796623.png)
In this study, Si-rich silicon oxide (SiO1.56) films are fabricated by reactive sputtering and subsequently annealed at high temperature in N2 or Ar atmosphere. High-resolution transmission electron microscopy (HRTEM) and Raman spectrum confirms the formation of silicon nanocrystals (nc-Si). After the first step annealing process, oxygen is introduced as a post-annealing atmosphere. It has been observed that the photoluminescence properties of the films change dramatically due to the post-annealing, and the variation differs depending on the first-step annealing atmosphere. The mechanism of this phenomenon has been discussed and it has been concluded that the post-annealing mainly serves as both a passivation and an oxidation process at the nanocrystal interface. Oxygen is considered to be a more stable passivating atmosphere for SiOx films annealed in N2 at high temperatures instead of H2.
Journal: Journal of Crystal Growth - Volume 289, Issue 2, 1 April 2006, Pages 564–567