کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1796978 | 1524486 | 2006 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis of the growth of RF sputtered ZnO thin films using the optical reflective second harmonic generation
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Analysis of the growth of RF sputtered ZnO thin films using the optical reflective second harmonic generation Analysis of the growth of RF sputtered ZnO thin films using the optical reflective second harmonic generation](/preview/png/1796978.png)
چکیده انگلیسی
Reflective second harmonic generation (RSHG) is used to analyze the growth condition of poly crystal zinc oxide (ZnO) film with a c-axis orientation, grown on the Si substrate by RF magnetron sputtering technique. It elucidates physical phenomena exhibited by growing ZnO thin films. Connecting with analytical results of the characteristic parameters derived from the X-ray patterns and SEM images, the relationship between the RSHG intensity and the substrate temperature reveals that the effect of the grain boundaries is the domination of the RSHG mechanism. The inclined structures of ZnO films on the Si substrate are explained with reference to these RSHG patterns.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 290, Issue 2, 1 May 2006, Pages 532-538
Journal: Journal of Crystal Growth - Volume 290, Issue 2, 1 May 2006, Pages 532-538
نویسندگان
Kuang-Yao Lo, Shih-Chieh Lo, Sheng-Yuan Chu, Ren-Chuan Chang, Chang-Feng Yu,