کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1813322 | 1525241 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Behavior of dislocations due to thermal shock and critical shear stress of Si in Czochralski crystal growth
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Generation of dislocations due to thermal shock in Czochralski (CZ) Si crystal growth under different dipping temperature is investigated. Generation of dislocations due to thermal shock could be suppressed by using a heavily B-doped CZ-Si seed, and the ability for such suppression increased with increasing B concentration in the seed. However, dislocations were generated when the temperature difference before and after the dipping of which a seed was sustained became large. Critical shear stress of B-doped Si crystal with a B concentration of 3Ã1018Â cmâ3 at the melting point of Si was estimated to be around 4Â MPa.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volume 404, Issues 23â24, 15 December 2009, Pages 4612-4615
Journal: Physica B: Condensed Matter - Volume 404, Issues 23â24, 15 December 2009, Pages 4612-4615
نویسندگان
Toshinori Taishi, Keigo Hoshikawa, Yutaka Ohno, Ichiro Yonenaga,