کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1814957 | 1525254 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Distribution of electrically active nickel atoms in silicon crystals measured by means of deep level transient spectroscopy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
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چکیده انگلیسی
Diffusion profiles of electrically active nickel atoms (substitutional nickel atoms; Nis) in dislocated n- and p-type, and dislocation-free n-type silicon crystals are investigated by deep level transient spectroscopy (DLTS). The concentrations of Nis are evaluated from DLTS signals due to amphoteric nickel center which introduces an acceptor level of Ec-0.46eV in n-type silicon and a donor level of Ev+0.18eV in p-type silicon. The profiles are analyzed on the basis of the theory of the dissociative mechanism. It is found that dislocations in dislocated silicon and presumably precipitates of nickel in dislocation-free silicon play the important roles as sinks and sources of vacancies existing in the crystal bulk, giving rise to the flat distribution of Nis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volumes 401â402, 15 December 2007, Pages 115-118
Journal: Physica B: Condensed Matter - Volumes 401â402, 15 December 2007, Pages 115-118
نویسندگان
Shuji Tanaka, Hajime Kitagawa,