کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1815010 | 1525254 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Shallow and deep defects in AlxGa1âxN structures
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Shallow and deep defects in AlxGa1âxN structures Shallow and deep defects in AlxGa1âxN structures](/preview/png/1815010.png)
چکیده انگلیسی
We report electrical characterization of AlxGa1âxN materials grown by MOCVD. The techniques used in this study were admittance spectroscopy and photocurrent measurements. We identify a continuum of shallow donors with ionization energies ranging from 50 to 110Â meV in AlxGa1âxN alloys with values of the Al mole fraction x=0.1 and 0.3. Investigations of the photocurrent buildup kinetics allow identification of a deep center with optical ionization energy of 1.2Â eV. This center controls the buildup of the photocurrent when the materials are illuminated with sub-bandgap photon energy. In the light of this finding we discuss the broad spectrum of DX-like defects that may contribute to the persistent photocurrent and the collapse in the drain current observed in AlGaN-related structures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volumes 401â402, 15 December 2007, Pages 335-338
Journal: Physica B: Condensed Matter - Volumes 401â402, 15 December 2007, Pages 335-338
نویسندگان
D. Seghier, H.P. Gislason,