کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1815722 1025670 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of Tl addition on the electrical properties of amorphous As20Se80−xTlx films
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Effect of Tl addition on the electrical properties of amorphous As20Se80−xTlx films
چکیده انگلیسی
Thin films of As20Se80−xTlx; (5⩽x⩽35at%) were prepared by thermal evaporation of the bulk materials. The effect of Tl addition on the electrical properties of As-Se-Tl chalcogenide semiconductors has been studied in the homogeneous glass-forming region through the low- and high-temperature range (173-373 K). The results indicated that the conduction in these glasses is through an activated process having two conduction mechanisms (band conduction in extended states and hopping conduction in localized states). The thallium in the As-Se-Tl ternary system tends to decrease the glass transition and melting temperatures and increase the DC conductivity in the amorphous phase. The activation energy for As20Se80−xTlx is found to vary between 0.9 and 0.64 eV. A comparison between computed and measured densities was performed. The measured density appeared to be smaller than the computed one. This difference is attributed to the transformation of the material to the amorphous nature.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physica B: Condensed Matter - Volume 371, Issue 2, 31 January 2006, Pages 218-222
نویسندگان
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