Development and test of model apparatus of non-contact spin processor for photo mask production applying radial-type superconducting magnetic bearing

In semiconductor devices, miniaturization of circuit patterning on wafers is required for higher integrations of circuit elements. Therefore, very high tolerance and quality are also required for patterning of microstructures of photo masks. The deposition of particulate dusts generated from mechanical bearings of the spin processor in the patterns of the photo mask is one of main causes of the deterioration of pattern preciseness. In our R&D, application of magnetic bearing utilizing bulk high temperature superconductors to the spin processors has been proposed. In this study, we develop a test spinner for the non-contact spinning process in the photo mask production system. The rotation test by using this test spinner shows that this test spinner accomplishes the improvement of the spinning ability compared with the test spinner developed in our previous study. This paper describes the rotation test results of the new test spinner applying the magnetic bearing with bulk high temperature superconductors.

► We develop test spinner for non-contact spinning process in photo mask production.
► This test spinner shows improved spinning ability compared with our previous one.
► Large vertical movement of turn table still occurs during acceleration.
► Method to control vertical movement of turn table should be developed in next step.