In situ patterning of filamentary YBCO coated conductors

Promising technique for in situ patterning of filamentary YBCO coated conductors with smooth surface without grooves has been developed. Selective epitaxial growth of the YBCO film forming continual filamentary structure with sharp, well defined interface between superconductive and resistive parts of the coating was processed on modified ISD–MgO buffered metallic substrate. Prior to the YBCO deposition, thin titanium metallic film patterned to strips by lift-off technique was deposited on the MgO buffer layer. For the filamentary YBCO film deposition a standard processing equipments exploiting standard physical deposition methods can be used, without any additional treatment of the YBCO coating after deposition.