Preparation of variable-thickness MgB2 thin film bridges by AFM nanolithography

In this paper we focus our attention on preparation of superconducting MgB2 thin films and variable-thickness MgB2 thin film bridges using the Atomic Force Microscope nanolithographic technique. Microstructures and their following variable-thickness bridges were prepared on nonsuperconducting MgB thin films. Final structures were annealed in argon atmosphere at temperature 680 °C and exhibit transition to the superconducting state Tcon = 33 K and zero critical temperature Tc0 = 30.5 K. Critical current density jc (4.2 K) measured on the bridge was higher than 106 A/cm2.