A temporal semi-stochastic model for pitting corrosion

• Our approach is a first attempt to demonstrate numerically the halide induced oscillations in Me | nM H2SO4 system.
• We explain the necessity of deterministic component along with the stochasticity to mimic the pitting induced dynamics.
• Our results depict the extent to which spatial features of oxide film can be compromised to get pitting induced dynamics.

We have proposed a mechanism that could possibly mimic the well known phenomenon of the halide ions induced oscillations in Me | nM H2SO4 system. It is assumed that close to the Flade potential region or anodic side far from the Flade potential are the scenarios wherein the applied potential is greater than the pitting potential. Consequently, the pitting initiation process occurs with unit probability and hence the stochastic pitting growth process becomes independent from the instantaneous pit depth. This pitting growth phenomenon is captured by time dependent stochastic functions (double exponential) along with the deterministic component. The consequences of mimicking the spatial features of oxide film breakdown by using the time dependent stochastic functions, are also discussed. Furthermore, the additional results have been provided to validate the proposed temporal semi-stochastic form of the model.