کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
219539 | 463278 | 2011 | 8 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Surface structure and electrochemical characteristics of boron-doped diamond exposed to rf N2-plasma Surface structure and electrochemical characteristics of boron-doped diamond exposed to rf N2-plasma](/preview/png/219539.png)
Epitaxial (100)-oriented diamond layer with boron doping above 1020 cm−3 was exposed to an RF N2 plasma, the resulting surface structure and electrochemical characteristics were investigated. The N2 plasma treatment was combined with in vacuo pre-heating to remove adsorbates and with surface shielding to reduce plasma-induced corrosion. X-ray photoemission spectroscopy revealed full nitrogenation of the surface with the presence of CN and CN bond structures. Anodic treatment in 0.1 M KOH in the oxygen evolution range generated nitrogen–oxygen bonds and carbon–oxygen functionalities which partially substitute the initial nitrogen-termination. The nitrogenated and electrochemically polarised diamond electrode exhibited higher catalytic activity to [Fe(CN)6]3−/4− but slower to [Ru(NH3)6]3+/2+ redox reactions, as compared to an identical diamond electrode with fully oxygen-terminated surface.
► CN and CN bond structures on diamond surface after exposure to RF N2 plasma.
► Partial oxidation of the N-terminated surface after anodic treatment in electrolytes.
► Higher activity to [Fe(CN)6]3−/4− reactions compared to fully oxygen-terminated surface.
Journal: Journal of Electroanalytical Chemistry - Volume 657, Issues 1–2, 1 July 2011, Pages 164–171